

I. CVD Silicon‑Carbon Anode Production Line – First Mass‑Production Solution in the Industry

1. Overcoming Three Key Industry Pain Points: Non‑uniform Deposition, Unstable Coating, Batch‑to‑Batch Variation
Boyee’s CVD silicon‑carbon anode production line employs an innovative fluidized‑bed chemical vapor deposition (CVD) technology, addressing critical industry challenges such as uneven silane deposition, unstable carbon coating layers, and significant batch‑to‑batch performance variations.
Through an intelligent batching system and precise atmosphere control, nano‑silicon is uniformly deposited within the porous carbon framework, resulting in a dense and robust carbon coating with excellent batch‑to‑batch consistency.

2. First Equipment Manufacturer to Build a Mass‑Production Line for CVD Silicon‑Carbon Anodes |Ton‑Scale Production Case Successfully Implemented
Boyee is the first equipment manufacturer in China to build a mass‑production line for CVD silicon‑carbon anodes, with a ton‑scale production case successfully put into operation. The process parameters have been validated through large‑scale production.
We provide full‑stage solutions ranging from laboratory R&D and pilot scale‑up to kiloton‑scale turnkey production lines, accelerating the industrialization of next‑generation high‑energy‑density anode materials.
Use Chemical Vapor Deposition (CVD) to fabricate a porous carbon skeleton.
Inside the prepared porous carbon, perform silane - based CVD to uniformly deposit silicon nanoparticles into the pores, fully utilizing the internal space for homogeneous distribution.
Apply a carbon coating to the silicon - loaded porous carbon to improve the energy density of the silicon - carbon anode.
Silicon carbon anode CVD producing line











①Multi-layer reactor design: Adjust reactor angles and optimize gas distribution to achieve uniform silicon deposition; ②Temperature control to avoid local variation: Precisely regulate temperature during deposition to prevent localized overheating, which may lead to non-uniform deposition.
①Synergistic effect of acetylene for improved coating integrity: First, form an initial coating via vapor deposition, followed by acetylene treatment to enhance carbon coverage;② Optimization of coating process parameters: Adjust temperature, duration, and atmosphere conditions during coating to ensure uniform decomposition and deposition of the carbon precursor on silicon particles, forming a dense and stable carbon layer;③ Pre-treatment and purity control of carbon precursors: Employ physical activation of the carbon precursor to enhance reactivity and interfacial bonding, and control precursor particle size and purity to prevent impurities from adversely affecting the carbon coating quality.
① Fluidized bed technology to overcome deposition non-uniformity: Place the carbon matrix in a fluidized particle bed; the flowing gas creates a liquid-like state, enabling uniform exposure of particles to silane gas and achieving homogeneous nano-silicon deposition;② Intelligent batching system: Automatically adjust ingredient ratios to eliminate batch-to-batch variability and uneven mixing.
① Optimization of collection system: Minimize material retention and loss during collection;② Optimization of reaction conditions: Precisely control gas flow and reaction time to improve carbon source utilization and reduce residual raw materials.
Continuously supply inert gas during the fluidized bed deposition process to maintain an inert environment. Simultaneously monitor oxygen levels in real time; if abnormal fluctuations occur, trigger timely alerts and adjustments to ensure a stable and controllable deposition process.

